Among the wide variety of airborne molecular contaminants (AMCs) that must be systematically monitored during semiconductor manufacturing processes, perfluoroalkyl and polyfluoroalkyl substances (PFAS) are increasingly of interest due to their negative impact on the environment and human health.
PFAS are an integral part of the semiconductor manufacturing process, thanks to their unique properties such as durability, corrosion resistance, and thermal stability. Given both the importance of producing high-quality chips and the growing concern about PFAS, it is crucial to find efficient ways to understand and mitigate emissions related to the production of these semiconductors.
TOFWERK AMC solutions are extremely sensitive and versatile; cutting-edge technology allows emissions of dozens of these compounds to be measured simultaneously, in real time, without sample preparation, and with extraordinary precision.
A single analyzer can provide a wealth of information on PFAS emissions into the air, even at parts per trillion (pptv) concentrations, giving users unprecedented insight into the sources of these compounds.